发明名称 |
High-efficiency diode laser |
摘要 |
A laser diode has a first n-conducting cladding layer, a first n-conducting waveguide layer arranged therein, an active layer is suitable for generating radiation arranged on the first waveguide layer, a second p-conducting waveguide layer, arranged on the active layer, and a second p-conducting cladding layer, arranged on the second waveguide layer the sum of the layer thickness of the first waveguide layer, the layer thickness of the active layer and the layer thickness of the second waveguide layer is greater than 1 μm and the layer thickness of the second waveguide layer is less than 150 nm. The maximum mode intensity of the fundamental mode is in a region outside the active layer, and the difference between the refractive index of the first waveguide layer and the refractive index of the first cladding layer is between 0.04 and 0.01. |
申请公布号 |
US8798109(B2) |
申请公布日期 |
2014.08.05 |
申请号 |
US201113978222 |
申请日期 |
2011.12.28 |
申请人 |
Forschungsverbund Berlin E.V. |
发明人 |
Götz Erbert;Wenzel Hans;Crump Paul |
分类号 |
H01S5/10 |
主分类号 |
H01S5/10 |
代理机构 |
Norris McLaughlin & Marcus P.A. |
代理人 |
Norris McLaughlin & Marcus P.A. |
主权项 |
1. A diode laser having:
a first n-conducting cladding layer, a first n-conducting waveguide layer, which is arranged on the first cladding layer, an active layer, which is suitable for generating radiation and which is arranged on the first waveguide layer, a second p-conducting waveguide layer, which is arranged on the active layer, and a second p-conducting cladding layer, which is arranged on the second waveguide layer, wherein the sum of the layer thickness of the first waveguide layer, the layer thickness of the active layer and the layer thickness of the second waveguide layer is greater than 1 μm and the layer thickness of the second waveguide layer is less than 150 nm, wherein the active layer, the first cladding layer, the second cladding layer, the first waveguide layer and the second waveguide layer are designed in such a manner that the maximum mode intensity of the fundamental mode is in a region outside the active layer, and wherein the difference between the refractive index of the first waveguide layer and the refractive index of the first cladding layer is between 0.04 and 0.01. |
地址 |
Berlin DE |