发明名称 Resist composition and method of forming resist pattern
摘要 A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid (R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents —COO—, a —CONH— group or a divalent aromatic hydrocarbon group; Y1 and Y2 represent a divalent linking group or a single bond; R′1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R′2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).;
申请公布号 US8795947(B2) 申请公布日期 2014.08.05
申请号 US201313847295 申请日期 2013.03.19
申请人 Tokyo Ohka Kogyo Co., Ltd. 发明人 Hirano Tomoyuki;Irie Makiko;Endo Kotaro;Kurosawa Tsuyoshi
分类号 G03F7/00;G03F7/004;C08F20/10 主分类号 G03F7/00
代理机构 Knobbe Martens Olson & Bear LLP 代理人 Knobbe Martens Olson & Bear LLP
主权项 1. A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) comprising a polymeric compound (A1) comprising a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid:wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents —COO—, a —CONH— group or a divalent aromatic hydrocarbon group; Y1 and Y2 each independently represents a divalent linking group or a single bond; R′1 represents a hydrogen atom; R′2 represents a methyl group; and R2 is a group represented by general formula (3-1) shown below:wherein A′ represents an oxygen atom; a represents an integer of 0 to 2; and R8 represents an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkl group or a cyano group, wherein R″ represents a hydrogen atom or an alkyl group.
地址 Kawasaki-shi JP
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