发明名称 |
Resist composition and method of forming resist pattern |
摘要 |
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid (R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents —COO—, a —CONH— group or a divalent aromatic hydrocarbon group; Y1 and Y2 represent a divalent linking group or a single bond; R′1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R′2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).; |
申请公布号 |
US8795947(B2) |
申请公布日期 |
2014.08.05 |
申请号 |
US201313847295 |
申请日期 |
2013.03.19 |
申请人 |
Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Hirano Tomoyuki;Irie Makiko;Endo Kotaro;Kurosawa Tsuyoshi |
分类号 |
G03F7/00;G03F7/004;C08F20/10 |
主分类号 |
G03F7/00 |
代理机构 |
Knobbe Martens Olson & Bear LLP |
代理人 |
Knobbe Martens Olson & Bear LLP |
主权项 |
1. A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure,
the base component (A) comprising a polymeric compound (A1) comprising a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid:wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents —COO—, a —CONH— group or a divalent aromatic hydrocarbon group; Y1 and Y2 each independently represents a divalent linking group or a single bond; R′1 represents a hydrogen atom; R′2 represents a methyl group; and R2 is a group represented by general formula (3-1) shown below:wherein A′ represents an oxygen atom; a represents an integer of 0 to 2; and R8 represents an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkl group or a cyano group, wherein R″ represents a hydrogen atom or an alkyl group. |
地址 |
Kawasaki-shi JP |