发明名称 Double-axis rotation rate sensor
摘要 A micromechanical rotation rate sensor, comprising at least one substrate, wherein the rotation rate sensor has at least a first and a second seismic mass which are coupled to one another by means of at least one coupling beam, and wherein the rotation rate sensor is embodied in such a way that it can detect rotation rates about at least a first and a second sensitive axis, wherein each seismic mass is assigned at least one actuator unit with which the deflection behavior of the seismic mass can be influenced.
申请公布号 US8794067(B2) 申请公布日期 2014.08.05
申请号 US201013255321 申请日期 2010.03.11
申请人 Continental Teves AG & Co. oHG 发明人 Schmid Bernhard;Günthner Stefan;Sivaraman Ramnath
分类号 G01C19/56 主分类号 G01C19/56
代理机构 RatnerPrestia 代理人 RatnerPrestia
主权项 1. A micromechanical rotation rate sensor, comprising at least one substrate, wherein the rotation rate sensor has at least a first and a second seismic mass which are coupled to one another by at least one coupling beam, and wherein the rotation rate sensor is embodied in such a way that it can detect rotation rates about at least a first and a second sensitive axis, wherein each seismic mass is assigned at least one actuator unit with which the deflection behavior of the seismic mass can be influenced, wherein the rotation rate sensor respectively comprises at least a first, a second and a third oscillator configuration with respect to the deflection of the first and second seismic masses, wherein the first oscillator configuration has at least one drive unit which imposes a driving oscillation on said first oscillator configuration, which driving oscillation comprises deflections of the seismic mass in the direction of a first axis, wherein the first oscillator configuration has a defined driving resonant frequency, and the second oscillator configuration is defined essentially by the deflections of the seismic mass in the direction of a second axis in the form of a first reading out oscillation, which oscillation is caused by the effect and/or detection of a rotational rate about the first sensitive axis, wherein the second oscillator configuration has a defined first reading out resonant frequency, the third oscillator configuration is defined essentially by the deflection of the seismic mass in the direction of a third axis in the form of a second reading out oscillation which is caused by the effect and/or detection of a rotation rate about the first second sensitive axis, wherein the third oscillator configuration has a defined second reading out resonant frequency, wherein the at least one coupling beam is embodied and arranged in such a way that it couples the deflections of the first and second seismic masses with respect to the first reading out oscillation within the second oscillator configuration, and the rotation rate sensor additionally has at least a second coupling beam, which is embodied and arranged in such a way that it couples the deflections of third and fourth seismic masses with respect to the second reading out oscillation within the third oscillator configuration.
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