Technique to modify the microstructure of semiconducting materials

摘要

A method of treating a sheet of semiconducting material comprises forming a sinterable first layer over each major surface of a sheet of semiconducting material, forming a second layer over each of the first layers to form a particle-coated semiconductor sheet, placing the particle-coated sheet between end members, heating the particle-coated sheet to a temperature effective to at least partially sinter the first layer and at least partially melt the semiconducting material, and cooling the particle-coated sheet to solidify the semiconducting material and form a treated sheet of semiconducting material.

主权项

1. A particle-coated semiconductor sheet, comprising:
a sheet of semiconducting material having opposing major surfaces; a sinterable first particle layer formed over each major surface; and a second particle layer formed over each of the sinterable first particle layers, wherein the sinterable first particle layers comprise functionalized particles, said functionalized particles comprising a dopant selected from the group consisting of boron, phosphorus and gallium.