| 发明名称 | Gas transport delay resolution for short etch recipes | ||
| 摘要 | In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits. | ||
| 申请公布号 | US8794267(B2) | 申请公布日期 | 2014.08.05 |
| 申请号 | US200812810756 | 申请日期 | 2008.12.17 |
| 申请人 | Lam Research Corporation | 发明人 | Shareef Iqbal;Taskar Mark;Zemlock Tony |
| 分类号 | F16K11/10 | 主分类号 | F16K11/10 |
| 代理机构 | Beyer Law Group LLP | 代理人 | Beyer Law Group LLP |
| 主权项 | 1. An apparatus for providing a gas mixture of a plurality of gases, comprising: a plurality of mass flow controllers (MFCs); a mixing manifold in fluid connection with each of the plurality of MFCs; a plurality of mixing manifold exit valves positioned on the mixing manifold; and an isolation chamber in fluid connection with each of the plurality of mixing manifold exit valves. | ||
| 地址 | Fremont CA US | ||