Illumination system of a microlithographic projection exposure apparatus having a temperature control device

摘要

An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

主权项

1. An illumination system having a pupil surface, the illumination system comprising:
a mirror array comprising a plurality of mirror elements, each mirror element comprising a mirror support and a reflective coating, and each mirror element being configured to direct light produced by a primary light source toward the pupil surface; and a temperature control device, wherein:
each mirror element comprises structures that have different coefficients of thermal expansion;for each mirror element, the structures are fixedly attached to each other;the temperature control device comprises a radiation system configured to selectively direct radiation to target areas on the reflective coating and is configured to variably modify a temperature distribution within the structures of the mirror elements to individually change a shape of each mirror element;the mirror elements have concave mirror surfaces, and the temperature control device is configured to modify a temperature distribution within the structures so that the mirror elements have different focal lengths in two orthogonal planes; andthe illumination system is configured to be used in a microlithographic projection exposure apparatus.