发明名称 JOINING METHOD AND JOINING SYSTEM
摘要 A vertical distortion of a joined substrate is suppressed by appropriately holding substrates when the substrates are joined together. A joining device includes: an upper chuck configured to draw and hold an upper wafer on a lower surface; a lower chuck provided below the upper chuck and configured to draw and hold a lower wafer on an upper surface; and a lower chuck holding unit provided below the lower chuck and configured to draw and hold the lower chuck. On a first main body portion of the lower chuck holding unit, a central protrusion, which is projected compared to the surrounding and is in contact with the lower chuck, is provided. On a second main body portion and a third main body portion of the lower chuck holding unit, a suction groove for vacuum-sucking the lower chuck is orbitally formed over a concentric circle two times. On a fourth main body portion of the lower chuck holding unit, a plurality of outer peripheral protrusions, which are projected from the surroundings and are in contact with the lower chuck, are provided.
申请公布号 KR20140095982(A) 申请公布日期 2014.08.04
申请号 KR20140007410 申请日期 2014.01.21
申请人 TOKYO ELECTRON LIMITED 发明人 SUGIHARA SHINTARO;YOSHITAKA NAOTO;KITAHARA SHIGENORI;HIROSE KEIZO
分类号 H01L21/20 主分类号 H01L21/20
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