A RADIATION MODULATOR FOR A LITHOGRAPHY APPARATUS, A LITHOGRAPHY APPARATUS, A METHOD OF MODULATING RADIATION FOR USE IN LITHOGRAPHY, AND A DEVICE MANUFACTURING METHOD.

摘要

A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.