PLASMA EQUIPMENT

摘要

Disclosed are plasma equipment and a dry cleaning method thereof. The equipment comprises a chamber providing a sealed space inside; a shower head disposed on the upper part of the chamber and discharging cleaning gas into the chamber; high-frequency power generating the cleaning gas to plasma gas; an upper electrode disposed inside the shower head; a lower electrode disposed at the lower part of the chamber; a chuck covering the lower electrode; and a field induction unit protecting the chuck from the plasma gas, disposed outside the chamber to concentrate the plasma gas on an inner side wall of the chamber, and inducing an electric field or a magnetic field within the chamber in a direction parallel to the lower electrode.