| 发明名称 |
METHOD FOR FORMING GRAPHENE PATTERN |
| 摘要 |
There is provided a method for forming a graphene pattern, in which a graphene thin film layer is transferred onto a surface of a photosensitive film, and then patterned through exposure/development of the photosensitive film. The photosensitive film is cured after being finally developed, thereby securing stability and reliability. |
| 申请公布号 |
US2014212818(A1) |
申请公布日期 |
2014.07.31 |
| 申请号 |
US201313911374 |
申请日期 |
2013.06.06 |
| 申请人 |
Kang Sung-Ku;Jeon Byeong-Kyu;Kim Jung-Yun |
发明人 |
Kang Sung-Ku;Jeon Byeong-Kyu;Kim Jung-Yun |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for forming a graphene pattern, comprising:
transferring a graphene thin film layer onto a surface of a photosensitive film; transferring and attaching, to a substrate, the photosensitive film having the graphene thin film layer formed on the surface thereof; and placing a mask having a predetermined pattern implemented therein above the graphene thin film layer, and patterning the graphene thin film layer through a photolithography process. |
| 地址 |
Yongin-City KR |
