发明名称 |
METHODS OF MANUFACTURING NAND FLASH MEMORY DEVICES |
摘要 |
A NAND flash memory device includes a plurality of continuous conductors disposed on a common level of a multilayer substrate, the plurality of continuous conductors including respective conductive lines extending in parallel along a first direction, respective contact pads disposed at ends of the respective conductive lines and respective conductive dummy lines extending in parallel from the contact pads along a second direction |
申请公布号 |
US2014210095(A1) |
申请公布日期 |
2014.07.31 |
申请号 |
US201414227625 |
申请日期 |
2014.03.27 |
申请人 |
Park Jang-ho;Park Jae-Kwan;Kwak Dong-hwa;Jin So-wi;Hwang Byung-jun;Lim Nam-su |
发明人 |
Park Jang-ho;Park Jae-Kwan;Kwak Dong-hwa;Jin So-wi;Hwang Byung-jun;Lim Nam-su |
分类号 |
H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
|
代理人 |
|
主权项 |
1. A semiconductor memory device comprising:
a substrate; a plurality of parallel first conducive lines on the substrate, wherein the plurality of parallel first conductive lines extends in a first direction on a memory cell region and on a contact region of the substrate; and a plurality of parallel second conductive lines on the contact region of the substrate, wherein the plurality of parallel second conductive lines extends in a second direction different than the first direction, wherein each of the second conductive lines is connected to a respective one of the first conductive lines, wherein a first one of the second conductive lines is between a second one of the second conductive lines and the memory cell region, and wherein a length of the first one of the second conductive lines is less than a length of the second one of the second conductive lines. |
地址 |
Hwaseong-si KR |