MULTI-PARTICLE BEAM COLUMN HAVING AN ELECTRODE LAYER INCLUDING AN ECCENTRIC APERTURE

摘要

Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.

主权项

1. A multi-particle beam column, comprising two or more particle beam columns, each comprising a particle beam emission source, a deflector, and two or more electrode layers,
wherein the multi-particle beam column comprises at least one electrode layer having two or more apertures that are eccentric from respective beam optical axes of the particle beam columns (hereinafter referred to as the “eccentric electrode layer”), wherein the respective apertures of the eccentric electrode layer are positioned to the direction from the respective beam optical axes of the multi-particle beam column so as to avoid overlapping on the basis of the respective particle beam optical axes, wherein the eccentric electrode layer is positioned below the deflector, and wherein the respective particle beams of the multi-particle beam column are not simultaneously irradiated onto a sample.