| 摘要 |
<p>In the present invention, the composition ratio of a composite film is controlled using the phenomenon of the elemental ratio in a plasma flow changing with time. Provided is a film-forming device that, using a composite material that is a mixture of multiple starting materials, forms on a target object a film containing multiple elements from multiple starting materials. The film-forming device comprises a discharge part for subjecting the composite material to arc discharge causing a multiple-element plasma discharge, and a control part for controlling the plasma flow that reaches the target object, on the basis of the composition ratio of multiple elements present in the plasma flowing toward the target object.</p> |
