| 摘要 |
The invention relates to electroplating, namely to a process for chromium electroplating.The process, according to the invention, includes the chromium electroplating from the tetrachromate electrolyte, containing, g/l: CrO3 - 350…400, H2SO4 - 2.5…2.7, NaOH - 40…60, sugar - 1, using a three-phase current source and an inductive-capacitive device, connected in series between the negative poles of the three-phase current source and the electroplating bath. At the same time, the device consists of two units - capacitive and inductive, interconnected in parallel, the inductive unit having the inductance within the limits 0.1 µH…10.0 H, and the capacitive unit having the total capacity within the limits 0.01…0.10 F. |
