SUBSTRATE PROCESSING APPARATUS AND CORRECTION METHOD OF TEMPERATURE SIGNAL

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a correction method of a temperature signal which can improve workability and reduce costs while assuring measurement performance of the temperature, in heating of a processing furnace of the substrate processing apparatus.SOLUTION: The substrate processing apparatus has: a heating section which heats the inside of the processing furnace; and a temperature control section in which a measurement section which converts a temperature signal from temperature detection means and a control section for outputting the control signal in the heating section on the basis of the converted temperature signal are formed as a separate structure. The measurement section has: a switching section which switches the temperature signal to be converted; and a first storage section which stores calibration data. The control section has a control calculation section which corrects the temperature signal on the basis of the calibration data when the calibration data is within a predetermined first range if the identification data in the measurement section and the control section are matched with each other, and corrects the temperature signal on the basis of the calibration data stored in a second storage section which is provided in the control section when the temperature signal converted by the measurement section is within a predetermined second range if the identification data in the measurement section and the control section are not matched with each other.