发明名称 |
THERMAL MONITOR FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE |
摘要 |
<p>A first temperature distribution that represents a temperature of an element adjacent to and distinct from a first optical element that is positioned to receive an amplified light beam is accessed. The accessed first temperature distribution is analyzed to determine a temperature metric associated with the element, the determined temperature metric is compared to a baseline temperature metric, and an adjustment to position of the amplified light beam relative to the first optical element is determined based on the comparison.</p> |
申请公布号 |
WO2014116371(A1) |
申请公布日期 |
2014.07.31 |
申请号 |
WO2013US75871 |
申请日期 |
2013.12.17 |
申请人 |
CYMER, LLC |
发明人 |
FLEUROV, VLADIMIR;FOMENKOV, IGOR, V.;SRIVASTAVA, SHAILENDRA, N. |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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