| 发明名称 |
METHOD AND DEVICE FOR CONTINUOUSLY COATING SUBSTRATES |
| 摘要 |
The invention relates to a method for continuous coating of substrates, in which the substrates are transported continuously through a deposition chamber and, at the same time, measures are adopted for reducing parasitic deposits as well as possible. Likewise, the invention relates to a corresponding device for continuous coating of substrates. |
| 申请公布号 |
US2014212583(A1) |
申请公布日期 |
2014.07.31 |
| 申请号 |
US201214131055 |
申请日期 |
2012.07.09 |
| 申请人 |
Reber Stefan;Schillinger Norbert;Pocza David;Arnold Martin |
发明人 |
Reber Stefan;Schillinger Norbert;Pocza David;Arnold Martin |
| 分类号 |
C23C16/54;C23C16/458 |
主分类号 |
C23C16/54 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for continuous coating of substrates in which, in a coating device, the substrates are transported through a deposition chamber which is delimited by two substrate carriers and also a base and a cover, the base having a device for guiding the substrate carriers, the substrates on the substrate carriers being transported through the coating device, the continuous coating of the substrates being effected during the transport and the cover being fixed to the substrate carriers and thus being transported together with the substrate carriers through the coating device. |
| 地址 |
Gundelfingen DE |
