发明名称 GAS ANALYSIS APPARATUS
摘要 A gas analysis apparatus includes: a first reflector that reflects measurement light from a light emitting unit disposed outside a gas flue wall and transmitted through a sample gas. A light receiving unit outside the gas flue wall receives measurement light reflected by the first reflector. A second reflector outside the gas flue wall reflects measurement light toward the light receiving unit. A computing unit analyzes sample gas by allowing the measurement light to be reflected by the first reflector and performs correction or calibration of the gas analysis apparatus using known substances within an associated containing unit along the light path between the light emitting unit and the second reflector by allowing measurement light to be reflected by the second reflector. A switching unit outside the gas flue wall selectively removes or inserts the second reflector from the light path during component concentration analysis and correction or calibration, respectively.
申请公布号 US2014211209(A1) 申请公布日期 2014.07.31
申请号 US201214238520 申请日期 2012.08.10
申请人 Ido Takuya;Ohnishi Toshikazu;Mori Tetsuya 发明人 Ido Takuya;Ohnishi Toshikazu;Mori Tetsuya
分类号 G01N21/61 主分类号 G01N21/61
代理机构 代理人
主权项 1. A gas analysis apparatus configured to analyze concentrations of element gases in a sample gas flowing in a flue, the gas analysis apparatus comprising: a light-emitting unit arranged outside a wall of the flue and configured to apply a measurement light to the sample gas; a first reflector configured to reflect the measurement light applied from the light-emitting unit and that has been transmitted through the sample gas; a light-receiving unit arranged in the vicinity of the light-emitting unit and outside the wall of the flue, and configured to receive the measurement light reflected by the first reflector; a second reflector arranged outside the wall of the flue and configured to reflect the measurement light to the light-receiving unit; a known substance containing unit arranged in a space region along a light path between the light-emitting unit and the second reflector and between the second reflector and the light receiving unit, the known substance containing unit containing a known substance that allows the measurement light applied from the light-emitting unit not to be attenuated or to be attenuated by a predetermined amount; a computing unit configured both to analyze the concentrations of the element gases in the sample gas using the measurement light reflected by the first reflector and to perform at least one of a correction and a calibration with the known substance using the measurement light reflected by the second reflector; and a switching unit arranged outside the wall of the flue and configured to remove the second reflector from the light path when performing the analysis of the concentrations of the element gases and to place the second reflector into the light path when performing at least one of the correction and the calibration.
地址 Kyoto-shi JP