PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

摘要

A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.

主权项

1. An immersion projection optical system which images a pattern provided in an object surface of the immersion projection optical system onto an image surface of the immersion projection optical system, comprising:
a first lens unit including at least to lenses; a mirror group, arranged between the first lens unit and the image surface, including of two mirrors; a second lens unit, arranged between the mirror group and the image surface, including at least one lens; a third lens unit, arranged between the second lens unit and the image surface, including at least two negative lenses; and a fourth lens unit, arranged between the second lens unit and the image surface, including a liquid immersed optical element which is contact with a liquid and a plurality of lenses between the third lens unit and the liquid immersed optical element, wherein a maximum diameter of the fourth lens unit larger than a maximum diameter of the third lens unit, wherein number of mirrors belonging the immersion projection optical system are two, and wherein every transmitting member and every mirror constituting the projection optical system are arranged along a single straight optical axis.