发明名称 |
METHOD AND APPARATUS FOR AMELIORATING PERIPHERAL EDGE DAMAGE IN MAGNETORESISTIVE TUNNEL JUNCTION (MTJ) DEVICE FERROMAGNETIC LAYERS |
摘要 |
An in-process magnetic layer having an in-process area dimension is formed with a chemically damaged region at a periphery. At least a portion of the chemically damaged region is transformed to a chemically modified peripheral portion that is non-ferromagnetic. Optionally, the transforming is by oxidation, nitridation or fluorination, or combinations of the same. |
申请公布号 |
US2014210021(A1) |
申请公布日期 |
2014.07.31 |
申请号 |
US201313749731 |
申请日期 |
2013.01.25 |
申请人 |
QUALCOMM INCORPORATED |
发明人 |
Zhu Xiaochun;Li Xia;Kang Seung H. |
分类号 |
H01L43/12;H01L43/02 |
主分类号 |
H01L43/12 |
代理机构 |
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代理人 |
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主权项 |
1. A method for forming a magnetic tunnel junction layer:
forming an in-process ferromagnetic layer having a ferromagnetic main region surrounded by a chemically damaged peripheral region, wherein the chemically damaged peripheral region is weak ferromagnetic; and transforming at least a portion of the chemically damaged peripheral region to a chemically modified peripheral portion to form the magnetic tunnel junction layer, wherein the chemically modified peripheral portion is non-ferromagnetic. |
地址 |
San Diego CA US |