发明名称 METHOD AND APPARATUS FOR AMELIORATING PERIPHERAL EDGE DAMAGE IN MAGNETORESISTIVE TUNNEL JUNCTION (MTJ) DEVICE FERROMAGNETIC LAYERS
摘要 An in-process magnetic layer having an in-process area dimension is formed with a chemically damaged region at a periphery. At least a portion of the chemically damaged region is transformed to a chemically modified peripheral portion that is non-ferromagnetic. Optionally, the transforming is by oxidation, nitridation or fluorination, or combinations of the same.
申请公布号 US2014210021(A1) 申请公布日期 2014.07.31
申请号 US201313749731 申请日期 2013.01.25
申请人 QUALCOMM INCORPORATED 发明人 Zhu Xiaochun;Li Xia;Kang Seung H.
分类号 H01L43/12;H01L43/02 主分类号 H01L43/12
代理机构 代理人
主权项 1. A method for forming a magnetic tunnel junction layer: forming an in-process ferromagnetic layer having a ferromagnetic main region surrounded by a chemically damaged peripheral region, wherein the chemically damaged peripheral region is weak ferromagnetic; and transforming at least a portion of the chemically damaged peripheral region to a chemically modified peripheral portion to form the magnetic tunnel junction layer, wherein the chemically modified peripheral portion is non-ferromagnetic.
地址 San Diego CA US