发明名称 ESD-Protection Circuit for Integrated Circuit Device
摘要 A double-diffused metal oxide semiconductor (DMOS) structure is configured as an open drain output driver having electrostatic discharge (ESD) protection and a reverse voltage blocking diode inherent in the structure and without requiring metal connections for the ESD and reverse voltage blocking diode protections.
申请公布号 US2014210007(A1) 申请公布日期 2014.07.31
申请号 US201414167331 申请日期 2014.01.29
申请人 Microchip Technology Incorporated 发明人 Deval Philippe;Fernandez Marija;Besseux Patrick;Braithwaite Rohan
分类号 H01L27/02;H01L27/12 主分类号 H01L27/02
代理机构 代理人
主权项 1. An open drain output driver cell having electro-static discharge protection, comprising: an N− well; a first P− body diffused in the N− well, wherein the first P− body comprises a first P+ diffusion and a first N+ diffusion; a second P− body diffused in the N− well, wherein the second P− body comprises a second P+ diffusion and a second N+ diffusion; a first gate and a first insulating oxide over a portion of the first P-body and a portion of the N− well, wherein the first gate provides for control of the output driver cell; a second gate and a second insulating oxide over a portion of the second P-body and a portion of the N-well; the first P+ diffusion and the first N+ diffusion are connected together to provide a source and body contact for the output driver cell; and the second P+ diffusion, the second N+ diffusion and the second gate are connected together to provide a drain for the output driver cell; wherein an electro-static discharge (ESD) and reverse voltage protection diode is formed between the first and second P− bodies.
地址 Chandler AZ US