发明名称 |
ESD-Protection Circuit for Integrated Circuit Device |
摘要 |
A double-diffused metal oxide semiconductor (DMOS) structure is configured as an open drain output driver having electrostatic discharge (ESD) protection and a reverse voltage blocking diode inherent in the structure and without requiring metal connections for the ESD and reverse voltage blocking diode protections. |
申请公布号 |
US2014210007(A1) |
申请公布日期 |
2014.07.31 |
申请号 |
US201414167331 |
申请日期 |
2014.01.29 |
申请人 |
Microchip Technology Incorporated |
发明人 |
Deval Philippe;Fernandez Marija;Besseux Patrick;Braithwaite Rohan |
分类号 |
H01L27/02;H01L27/12 |
主分类号 |
H01L27/02 |
代理机构 |
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代理人 |
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主权项 |
1. An open drain output driver cell having electro-static discharge protection, comprising:
an N− well; a first P− body diffused in the N− well, wherein the first P− body comprises a first P+ diffusion and a first N+ diffusion; a second P− body diffused in the N− well, wherein the second P− body comprises a second P+ diffusion and a second N+ diffusion; a first gate and a first insulating oxide over a portion of the first P-body and a portion of the N− well, wherein the first gate provides for control of the output driver cell; a second gate and a second insulating oxide over a portion of the second P-body and a portion of the N-well; the first P+ diffusion and the first N+ diffusion are connected together to provide a source and body contact for the output driver cell; and the second P+ diffusion, the second N+ diffusion and the second gate are connected together to provide a drain for the output driver cell; wherein an electro-static discharge (ESD) and reverse voltage protection diode is formed between the first and second P− bodies. |
地址 |
Chandler AZ US |