ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE

摘要

Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.;

主权项

1. An actinic-ray- or radiation-sensitive resin composition comprising any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, in which each of R1 and R2 independently represents an aryl group, provided that R1 and R2 may be connected to each other; each of R3 and R4 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group or an aryl group, provided that R3 and R4 may be connected to each other; R5 represents an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an aralkyl group or an alkylcarbonyl group, provided that R5 may be connected to R3 or R4; and X− represents a nonnucleophilic anion.