发明名称 |
THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF |
摘要 |
A thin film transistor (TFT) array panel and a manufacturing method thereof are disclosed. A contact hole may be formed to expose a pad disposed on a substrate of the TFT array panel. A first layer of a connecting member is formed with the same layer as a first field generating electrode and is disposed in the contact hole. A second passivation layer is disposed in the TFT array panel, but is removed at a region where the contact hole is formed and portions of the second passivation layer that cover the first layer of the connecting member. A second layer of the connecting member is formed on the first layer of the connecting member. |
申请公布号 |
US2014209915(A1) |
申请公布日期 |
2014.07.31 |
申请号 |
US201414158133 |
申请日期 |
2014.01.17 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
PARK Jeong Min;PARK Sung Kyun;LEE Jung-Soo;KIM Ji-Hyun;CHUN Jun |
分类号 |
H01L27/12 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A thin film transistor array panel, comprising:
a substrate; a gate line and a gate pad disposed on the substrate; a gate insulating layer disposed on the gate line and the gate pad; a data line and a data pad disposed on the gate insulating layer; a first passivation layer disposed on the data line and the data pad; an organic layer disposed on the first passivation layer; a first field generating electrode disposed on the organic layer; and a second passivation layer disposed on the first field generating electrode, wherein the organic layer is disposed in a first region comprising the gate pad and the organic layer is disposed in a second region comprising the data pad, and wherein the second passivation layer is not disposed in the first region and the second region. |
地址 |
Yongin-city KR |