发明名称 THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
摘要 A thin film transistor (TFT) array panel and a manufacturing method thereof are disclosed. A contact hole may be formed to expose a pad disposed on a substrate of the TFT array panel. A first layer of a connecting member is formed with the same layer as a first field generating electrode and is disposed in the contact hole. A second passivation layer is disposed in the TFT array panel, but is removed at a region where the contact hole is formed and portions of the second passivation layer that cover the first layer of the connecting member. A second layer of the connecting member is formed on the first layer of the connecting member.
申请公布号 US2014209915(A1) 申请公布日期 2014.07.31
申请号 US201414158133 申请日期 2014.01.17
申请人 Samsung Display Co., Ltd. 发明人 PARK Jeong Min;PARK Sung Kyun;LEE Jung-Soo;KIM Ji-Hyun;CHUN Jun
分类号 H01L27/12 主分类号 H01L27/12
代理机构 代理人
主权项 1. A thin film transistor array panel, comprising: a substrate; a gate line and a gate pad disposed on the substrate; a gate insulating layer disposed on the gate line and the gate pad; a data line and a data pad disposed on the gate insulating layer; a first passivation layer disposed on the data line and the data pad; an organic layer disposed on the first passivation layer; a first field generating electrode disposed on the organic layer; and a second passivation layer disposed on the first field generating electrode, wherein the organic layer is disposed in a first region comprising the gate pad and the organic layer is disposed in a second region comprising the data pad, and wherein the second passivation layer is not disposed in the first region and the second region.
地址 Yongin-city KR