发明名称 TRANSPARENT ELECTROCONDUCTIVE SUBSTRATE AND METHOD FOR PRODUCING SAME
摘要 <p>The purpose of the present invention is to provide a transparent electroconductive film in which a transparent electroconductive film obtained by making a two-layer structure into a single layer is formed on a transparent film substrate, and to provide a production method for making a two-layer transparent electroconductive film laminate into a single layer. Disclosed is a transparent electroconductive substrate in which a single-layer crystalline transparent electroconductive film comprising indium oxide and including an oxide of at least one type of bivalent to hexavalent metallic element is formed on one surface or both surfaces of a transparent substrate, the transparent electroconductive substrate being characterized in that: the transparent electroconductive film is made by forming a first amorphous transparent electroconductive film and a second amorphous transparent electroconductive film in order as two layers, and then subjecting the obtained transparent electroconductive film laminate to a heat treatment; the total weight percentage of the oxide(s) of the bivalent to hexavalent metallic element(s) in the first amorphous transparent electroconductive film is different from that in the second amorphous transparent electroconductive film; and the total weight percentage of the oxide(s) of the bivalent to hexavalent metallic element(s) in the crystalline transparent electroconductive film is 16 wt% or less.</p>
申请公布号 WO2014115770(A1) 申请公布日期 2014.07.31
申请号 WO2014JP51268 申请日期 2014.01.22
申请人 SUMITOMO METAL MINING CO., LTD. 发明人 NAKAYAMA TOKUYUKI;ONO KATSUSHI;OKUBO KAZUHIKO
分类号 H01B5/14;B32B9/00;C23C14/08;G06F3/03;H01B13/00 主分类号 H01B5/14
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