发明名称 |
RADIAL TRANSMISSION LINE BASED PLASMA SOURCE |
摘要 |
<p>Radial transmission line based plasma sources for etch chambers are described. In an example, a radial transmission line based plasma source includes a gas delivery channel having a first end coupled to a gas inlet and having a second end coupled to a plasma showerhead. A folded or co-axial stub surrounds at least a portion of the gas delivery channel. An RF input is coupled to the folded or co-axial stub.</p> |
申请公布号 |
WO2014116448(A1) |
申请公布日期 |
2014.07.31 |
申请号 |
WO2014US11162 |
申请日期 |
2014.01.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
RAMASWAMY, KARTIK;LANE, STEVEN;YANG, YANG |
分类号 |
H05H1/24;H05H1/34 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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