发明名称 RADIAL TRANSMISSION LINE BASED PLASMA SOURCE
摘要 <p>Radial transmission line based plasma sources for etch chambers are described. In an example, a radial transmission line based plasma source includes a gas delivery channel having a first end coupled to a gas inlet and having a second end coupled to a plasma showerhead. A folded or co-axial stub surrounds at least a portion of the gas delivery channel. An RF input is coupled to the folded or co-axial stub.</p>
申请公布号 WO2014116448(A1) 申请公布日期 2014.07.31
申请号 WO2014US11162 申请日期 2014.01.10
申请人 APPLIED MATERIALS, INC. 发明人 RAMASWAMY, KARTIK;LANE, STEVEN;YANG, YANG
分类号 H05H1/24;H05H1/34 主分类号 H05H1/24
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