In-Situ Charging Neutralization

摘要

Some embodiments relate to a method for semiconductor processing. In this method, a semiconductor wafer is provided. A surface region of the semiconductor wafer is probed to determine whether excess charge is present on the surface region. Based on whether excess charge is present, selectively inducing a corona discharge to reduce the excess charge. Other techniques are also provided.

主权项

1. A method, comprising:
providing a semiconductor wafer; probing a surface region of the semiconductor wafer to determine whether a charge condition is present on the surface region; and based on whether the charge condition is present, selectively inducing a corona discharge to alter the charge condition.