发明名称 CHROME PLATING SOLUTION AND METHOD FOR FORMING CHROME PLATING FILM USING SAME
摘要 <p>This method for forming a chrome plating film uses electroplating to form a chrome plating film on an object (negative electrode)(1) to be plated. A chrome plating solution (15) is provided with: trivalent chromium ions; an organic carboxylic acid that forms a complex with at least some of the trivalent chromium atoms; and sulfur compound ions containing sulfur having an oxidation number of +VI. The chrome plating solution (15) has a pH of 0.5-2.6 inclusive, and does not contain sulfur having an oxidation number other than +VI. In the chrome plating solution (15), the value of (molar concentration of trivalent chromium ions forming a complex with the organic carboxylic acid)/(molar concentration of all trivalent chromium ions) is at least 0.5 and less than 1, and a positive electrode (3) is provided.</p>
申请公布号 WO2014115203(A1) 申请公布日期 2014.07.31
申请号 WO2013JP06522 申请日期 2013.11.05
申请人 C. UYEMURA & CO., LTD. 发明人 MURAKAMI, TORU;YANADA, ISAMU;MAEDA, RYO;HAMID, SUHAIMI;HASSAN, MURSHID;NAHRAWI, AIDILLA
分类号 C25D3/06;C25D17/10;C25D21/18 主分类号 C25D3/06
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