METHOD OF FORMING FUNCTIONAL COATINGS ON SILICON SUBSTRATES

摘要

A method of passivating a silicon substrate, comprising providing a silicon substrate having a surface, forming a stack of passivating and anti-reflection coating layers on said surface by liquid phase deposition, wherein the passivating and anti-reflection coating layers comprise hydrogenated silicon oxide layers, and providing at least titanium oxide or tantalum oxide capping layer on the stack opposite to the silicon substrate surface. The procedure offers an alternative to the existing ALD or PECVD methodsusing SiH 4 and other gases, enablingthe PV manufacturers to apply chemicals rather than work with hazardous gases to produce a series of layers that provide passivation as well as light absorption.