| 摘要 |
<p>A substrate carrier for plasma processing apparatus is disclosed, comprising: a base plate assembly comprising a platform on which a substrate is placed in use, the volume to be occupied in use by a substrate placed on the platform constituting a substrate zone; and a top plate assembly on the base plate assembly, the top plate assembly comprising a top plate having an aperture therethrough surrounding the substrate zone and one or more retention members extending into the aperture, over a portion of the substrate zone, such that in use a substrate disposed in the substrate zone is retained in a fixed position between the base plate assembly and the top plate assembly. The upper surface of the top plate, facing away from the base plate assembly, is substantially planar and the one or more retention members protrude above the substantially planar upper surface of the top plate.</p> |
