发明名称 SURFACE NANOFABRICATION METHODS USING SELF-ASSEMBLED POLYMER NANOMASKS
摘要 <p>Methods for fabricating a nanopillared substrate surface include applying a polymer solution containing an amphiphilic block copolymer and a hydrophilic homopolymer to a substrate surface. The amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution self-assemble on the substrate surface to form a self-assembled polymer layer having hydrophobic domains adjacent to the substrate surface and hydrophilic domains extending into the self-assembled polymer layer. At least a portion of the hydrophilic domains may be removed to form a plurality of pores in the exposed surface of the self-assembled polymer layer. A protective layer may be deposited on the exposed surface as a mask for etching through the plurality of pores to form through-holes. A nanopillar-forming material may be deposited onto the substrate surface via the through-holes. Then, the remaining portion of the self-assembled polymer layer may be removed to expose a nanopillared substrate surface.</p>
申请公布号 WO2014116547(A1) 申请公布日期 2014.07.31
申请号 WO2014US12228 申请日期 2014.01.21
申请人 CORNING INCORPORATED;QUESADA, MARK ALEJANDRO;WANG, JIANGUO;ZHANG, YING 发明人 QUESADA, MARK ALEJANDRO;WANG, JIANGUO;ZHANG, YING
分类号 G03F7/00 主分类号 G03F7/00
代理机构 代理人
主权项
地址