SURFACE NANOFABRICATION METHODS USING SELF-ASSEMBLED POLYMER NANOMASKS
摘要
<p>Methods for fabricating a nanopillared substrate surface include applying a polymer solution containing an amphiphilic block copolymer and a hydrophilic homopolymer to a substrate surface. The amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution self-assemble on the substrate surface to form a self-assembled polymer layer having hydrophobic domains adjacent to the substrate surface and hydrophilic domains extending into the self-assembled polymer layer. At least a portion of the hydrophilic domains may be removed to form a plurality of pores in the exposed surface of the self-assembled polymer layer. A protective layer may be deposited on the exposed surface as a mask for etching through the plurality of pores to form through-holes. A nanopillar-forming material may be deposited onto the substrate surface via the through-holes. Then, the remaining portion of the self-assembled polymer layer may be removed to expose a nanopillared substrate surface.</p>
申请公布号
WO2014116547(A1)
申请公布日期
2014.07.31
申请号
WO2014US12228
申请日期
2014.01.21
申请人
CORNING INCORPORATED;QUESADA, MARK ALEJANDRO;WANG, JIANGUO;ZHANG, YING