发明名称 |
METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER |
摘要 |
A method for producing an electrophotographic photosensitive member including an undercoat layer includes preparing a coating liquid for an undercoat layer containing zinc oxide particles, a polyol, a blocked isocyanate compound whose isocyanate group is blocked with a specific structure, and a solvent mixture, in which the solvent mixture contains a monohydric alcohol in an amount of 1 chemical equivalent or more based on the specific structure and 90% by mass or less based on the total mass of the solvent mixture, and a ketonic solvent and/or a cyclic ether solvent in an amount of 7% by mass or more based on the total mass of the solvent mixture. |
申请公布号 |
US2014212806(A1) |
申请公布日期 |
2014.07.31 |
申请号 |
US201414162584 |
申请日期 |
2014.01.23 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Sugiyama Kazumichi;Tanaka Daisuke;Noguchi Kazunori |
分类号 |
G03G5/05 |
主分类号 |
G03G5/05 |
代理机构 |
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代理人 |
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主权项 |
1. A method for producing an electrophotographic photosensitive member comprising a support, an undercoat layer formed on the support, and a photosensitive layer formed on the undercoat layer, the method comprising:
preparing a coating liquid for an undercoat layer containing:
zinc oxide particles;a polyol;a blocked isocyanate compound whose isocyanate group is blocked with a structure represented by the following formula (1); anda solvent mixture; forming a coat of the coating liquid for an undercoat layer, and drying and curing the coat to form the undercoat layer,wherein, in the formula (1)
X represents a single bond or an oxygen atom, R1 and R2 each independently represent an alkyl group having 1 to 4 carbon atoms, andwherein the solvent mixture comprises:
a monohydric alcohol in an amount of 1 chemical equivalent or more based on the structure represented by the formula (1), and 90% by mass or less based on the total mass of the solvent mixture; and a ketonic solvent and/or a cyclic ether solvent in an amount of 7% by mass or more based on the total mass of the solvent mixture. |
地址 |
Tokyo JP |