| 主权项 |
1. An exposure apparatus that exposes a substrate with an energy beam via a projection optical system and a liquid, the exposure apparatus comprising:
an immersion member provided surrounding an optical member of the projection optical system and configured to form an immersion area under the projection optical system with the liquid such that the liquid is in contact with the optical member, the immersion member having an opening through which the energy beam projected via the optical member is passed; a stage system having first and second substrate holding members and a motor, each of the first and second substrate holding members being configured to hold a corresponding first or second substrate in a hole formed on a part of an upper surface thereof, the upper surface being configured to contact with the liquid, the motor being configured to drive the first and second substrate holding members; and a controller configured to control the stage system (i) so as to execute a relative movement between the first and second substrate holding members such that, while one of the first and second substrate holding members is arranged opposed to the projection optical system, the other of the first and second substrate holding members comes close to the one of the first and second substrate holding members, and (ii) so as to move the close first and second substrate holding members relative to the immersion member below the projection optical system in a predetermined direction perpendicular to an optical axis of the projection optical system such that the other of the first and second substrate holding members is arranged opposite to the projection optical system in place of the one of the first and second substrate holding members while substantially maintaining the immersion area under the projection optical system. |
