发明名称 EXPOSURE METHOD AND EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To maintain position measurement accuracy of a position measurement system, such as an encoder, for measuring a position of a moving body holding an object to guarantee driving accuracy of the moving body.SOLUTION: In an exposure method, encoder heads (64, 65, 66 and the like) and Z heads (74, 76 and the like) are installed for measuring a position of a stage WST moving in a predetermined plane, and scales (39X, 39X, 39Yand 39Y) provided on a top face of the stage WST are irradiated with measurement beams emitted from these heads, and the amount of the irradiation of the scales with the measurement beams is adjusted by, during an idle period, changing a position relation between the scales and the respective heads by continuously moving the stage WST or retreating the stage WST to a region which does not irradiated with the measurement beams from the encoder heads and the Z heads.</p>
申请公布号 JP2014140071(A) 申请公布日期 2014.07.31
申请号 JP20140084099 申请日期 2014.04.16
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
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