发明名称 |
Layer construction with a protective coating and an exposed photopolymer layer |
摘要 |
<p>Layer structure comprises a protective layer and an exposed photopolymer layer. The protective layer is formed by reacting (a) at least one radiation-curable resin, (b) an isocyanate-functional resin, and (c) a photoinitiator system. The component (a) comprises = 5 wt.% compounds with a weight average molecular weight less than 500, and >= 75 wt.% compounds with a weight average molecular weight of greater than 1000. The component (b) comprises = 5 wt.% compounds with a weight average molecular weight of less than 500. The component (c) comprises e.g. at least 80 wt.% component (a). Layer structure comprises a protective layer and an exposed photopolymer layer. The protective layer is formed by reacting (a) at least one radiation-curable resin, (b) an isocyanate-functional resin, and (c) a photoinitiator system. The component (a) comprises = 5 wt.% compounds with a weight average molecular weight less than 500, and >= 75 wt.% compounds with a weight average molecular weight of greater than 1000. The component (b) comprises = 5 wt.% compounds with a weight average molecular weight of less than 500. The component (c) comprises at least 80 wt.% component (a) and not > 15 wt.% component (b). An independent claim is also included for producing the above layered structure, comprising applying a mixture comprising the components (a)-(c) on the exposed photopolymer layer, and curing.</p> |
申请公布号 |
EP2613318(B1) |
申请公布日期 |
2014.07.30 |
申请号 |
EP20120150275 |
申请日期 |
2012.01.05 |
申请人 |
BAYER INTELLECTUAL PROPERTY GMBH |
发明人 |
FÄCKE, THOMAS;BRUDER, FRIEDRICH-KARL;RÖLLE, THOMAS;WEISER, MARC-STEPHAN;HÖNEL, DENNIS;BERNETH, HORST;FLEMM, UTE |
分类号 |
G11B7/245;G11B7/24 |
主分类号 |
G11B7/245 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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