发明名称 |
SUBSTRATE TREATING APPARATUS, EXPOSING APPARATUS, AND CLEANING METHOD OF CLEANING TOOL |
摘要 |
The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized. |
申请公布号 |
KR101423611(B1) |
申请公布日期 |
2014.07.30 |
申请号 |
KR20080004955 |
申请日期 |
2008.01.16 |
申请人 |
|
发明人 |
|
分类号 |
H01L21/027;H01L21/304;H01L21/683 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|