发明名称 HOLDING APPARATUS, ASSEMBLY SYSTEM, SPUTTERING APPARATUS, MACHINING METHOD AND MACHINING APPARATUS
摘要 Because an electromagnetic chuck (20) supplies current to a specific microcoil among a plurality of microcoils (MC) and makes an object (M) exert an electromagnetic force working together with a magnet of the object (M), the object (M) can be held in a state where the object is set at a desired position (a position that corresponds to the microcoil to which current has been supplied) on a base surface. Further, by gas that blows out from a gas supply passage (42), a levitation force is given to the object (M), which can reduce effects of a friction force that acts between the object (M) and an upper surface of the electromagnetic chuck when the position of the object is set.
申请公布号 EP1944122(A4) 申请公布日期 2014.07.30
申请号 EP20060796794 申请日期 2006.08.25
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, YUICHI
分类号 B23Q3/15;B23K1/00;B25B11/00;B81C3/00;C23C14/04;C23C14/34;C23C14/50;H01F7/20 主分类号 B23Q3/15
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