Oxidation resistant nanocrystalline MCrAl(Y) coatings and methods of forming such coatings

摘要

The present disclosure relates to an oxidation resistant nanocrystalline coating and a method of forming an oxidation resistant nanocrystalline coating. An oxidation resistant coating comprising an MCrAl(Y) alloy may be deposited on a substrate, wherein M, includes iron, nickel, cobalt, or combinations thereof present greater than 50 wt % of the MCrAl(Y) alloy, chromium is present in the range of 15 wt % to 30 wt % of the MCrAl(Y) alloy, aluminum is present in the range of 6 wt % to 12 wt % of the MCrAl(Y) alloy and yttrium, is optionally present in the range of 0.1 wt % to 0.5 wt % of the MCrAl(Y) alloy. In addition, the coating may exhibit a grain size of 200 nm or less as deposited.

主权项

1. A method of forming an oxidation resistant nanocrystalline coating, comprising:
depositing via plasma enhanced magnetron sputtering one or more diffusion barrier interlayers on a substrate in a vacuum chamber, wherein said diffusion barrier interlayers include nitride compositions, carbide compositions and/or combinations thereof, wherein said nitride compositions and said carbide compositions include a metal or metalloid selected from one or more of the following: Zr, Ta, W, and Si; depositing via plasma enhanced magnetron sputtering an oxidation resistant coating comprising an MCrAl(Y) alloy on said substrate in said vacuum chamber, wherein M includes iron, nickel, cobalt, or combinations thereof present greater than 50 wt % of the MCrAl(Y) alloy, chromium is present in the range of 15 wt % to 30 wt % of the MCrAl(Y) alloy, aluminum is present in the range of 6 wt % to 12 wt % of the MCrAl(Y) alloy and yttrium is optionally present in the range of 0.1 wt % to 0.5 wt % of the MCrAl(Y) alloy, at a gas pressure of 1 mTorr to 10 mTorr and said coating exhibits a grain size of 5 nm to 20 nm as deposited, wherein during plasma enhanced magnetron sputtering a gas is supplied to said vacuum chamber and said gas is ionized with electrons discharged from an electron source and injected into said vacuum chamber.