发明名称 |
Active ester resin, method for producing the same, thermosetting resin composition, cured product of the thermosetting resin composition, semiconductor encapsulating material, pre-preg, circuit board, and build-up film |
摘要 |
A low dielectric constant, a low dielectric loss tangent, and heat resistance are achieved. An active ester resin that has a resin structure produced by reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3). The polyfunctional phenolic compound (a1) is represented by structural formula (1) below:;(where Ar represents a benzene ring, a naphthalene ring, a benzene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, or a naphthalene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, X represents a methylene group, a divalent cyclic aliphatic hydrocarbon group, a phenylene dimethylene group, or a biphenylene-dimethylene group, and n represents the number of repeating units and the average thereof is in a range of 0.5 to 10). |
申请公布号 |
US8791214(B2) |
申请公布日期 |
2014.07.29 |
申请号 |
US201213824821 |
申请日期 |
2012.05.25 |
申请人 |
DIC Corporation |
发明人 |
Takeuchi Kan;Suzuki Etsuko;Morinaga Kunihiro;Arita Kazuo |
分类号 |
B32B15/092;B32B27/04;C08G8/32;C08L61/14;C08L63/00 |
主分类号 |
B32B15/092 |
代理机构 |
Edwards Wildman Palmer LLP |
代理人 |
Edwards Wildman Palmer LLP |
主权项 |
1. A active ester resin comprising a resin structure produced by reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3) in such a manner that
an amount of the monofunctional aromatic carboxylic acid or its chloride (a2) is 0.46 to 0.95 moles and an amount of the aromatic dicarboxylic acid or its chloride (a3) is 0.27 to 0.025 moles per mole of phenolic hydroxyl groups of the polyfunctional phenolic compound (a1), the polyfunctional phenolic compound (a1) being represented by structural formula (1) below: (wherein Ar represents a benzene ring, a naphthalene ring, a benzene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, or a naphthalene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms;X represents a methylene group, a divalent cyclic aliphatic hydrocarbon group, a phenylene dimethylene group, or a biphenylene-dimethylene group; and n represents the number of repeating units and an average thereof is in a range of 0.5 to 10). |
地址 |
Tokyo JP |