发明名称 Light-emitting device and method of manufacturing the same
摘要 Provided is a light-emitting device including (a) a layer structure obtained by sequentially growing on a base substrate a first compound semiconductor layer of a first conductivity type, (b) an active layer formed of a compound semiconductor, and (c) a second compound semiconductor layer of a second conductivity type; a second electrode formed on the second compound semiconductor layer; and a first electrode electrically connected to the first compound semiconductor layer. The layer structure formed of at least a part of the second compound semiconductor layer in a thickness direction of the second compound semiconductor layer. The first compound semiconductor layer has a thickness greater than 0.6 μm. A high-refractive index layer formed of a compound semiconductor material having a refractive index higher than a refractive index of a compound semiconductor material of the first compound semiconductor layer is formed in the first compound semiconductor layer.
申请公布号 US8792160(B2) 申请公布日期 2014.07.29
申请号 US201213614646 申请日期 2012.09.13
申请人 Sony Corporation 发明人 Koda Rintaro;Watanabe Hideki;Kuramoto Masaru;Kono Shunsuke;Miyajima Takao
分类号 H01S5/22 主分类号 H01S5/22
代理机构 K&L Gates LLP 代理人 K&L Gates LLP
主权项 1. A light-emitting device comprising: a layer structure obtained by sequentially growing on a base substrate a first compound semiconductor layer of a first conductivity type, an active layer formed of a compound semiconductor, and a second compound semiconductor layer of a second conductivity type different from the first conductivity type; a second electrode formed on the second compound semiconductor layer; and a first electrode electrically connected to the first compound semiconductor layer, wherein the layer structure has a configuration formed of at least a part of the second compound semiconductor layer in a thickness direction of the second compound semiconductor layer, the first compound semiconductor layer has a thickness greater than 0.6 μm, and a high-refractive index layer formed of a compound semiconductor material having a refractive index higher than a refractive index of a compound semiconductor material of the first compound semiconductor layer is formed in the first compound semiconductor layer.
地址 Tokyo JP