发明名称 Semiconductor device including gate and conductor electrodes
摘要 An object is to provide a field effect transistor (FET) having a conductor-semiconductor junction, which has excellent characteristics, which can be manufactured through an easy process, or which enables high integration. Owing to the junction between a semiconductor layer and a conductor having a work function lower than the electron affinity of the semiconductor layer, a region into which carriers are injected from the conductor is formed in the semiconductor layer. Such a region is used as an offset region of the FET or a resistor of a semiconductor circuit such as an inverter. Further, in the case of setting up such an offset region and a resistor in one semiconductor layer, an integrated semiconductor device can be manufactured.
申请公布号 US8791529(B2) 申请公布日期 2014.07.29
申请号 US201313855203 申请日期 2013.04.02
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Takemura Yasuhiko
分类号 H01L29/78 主分类号 H01L29/78
代理机构 Robinson Intellectual Property Law Office, P.C. 代理人 Robinson Eric J.;Robinson Intellectual Property Law Office, P.C.
主权项 1. A semiconductor device comprising: a semiconductor layer comprising an offset region; a first conductor electrode and a second conductor electrode over and in contact with one surface of the semiconductor layer; and a gate over the semiconductor layer, wherein the offset region is provided in at least one of a region between the first conductor electrode and the gate and a region between the second conductor electrode and the gate, wherein the offset region of the semiconductor layer comprises an oxide semiconductor, and wherein a carrier concentration of the oxide semiconductor is lower than or equal to 1012/cm3.
地址 Atsugi-shi, Kanagawa-ken JP