| 发明名称 | Drawing apparatus, and method of manufacturing article | ||
| 摘要 | The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a first member in which an aperture, through which the charged particle beam passes, is formed, a chamber including a first space and a second space which are partitioned by the first member, and a removing device including a first supply device configured to supply a first gas containing unsaturated hydrocarbon to the first space and a second supply device configured to supply a second gas containing ozone to the second space, and configured to remove contamination on the first member by active species generated by reaction of the first gas with the second gas. | ||
| 申请公布号 | US8791431(B2) | 申请公布日期 | 2014.07.29 |
| 申请号 | US201314106027 | 申请日期 | 2013.12.13 |
| 申请人 | Canon Kabushiki Kaisha | 发明人 | Tanaka Ichiro |
| 分类号 | H01J37/305;H01J37/08;G21G5/00;G21G7/00 | 主分类号 | H01J37/305 |
| 代理机构 | Rossi, Kimms & McDowell LLP | 代理人 | Rossi, Kimms & McDowell LLP |
| 主权项 | 1. A drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus comprising: a first member in which an aperture, through which the charged particle beam passes, is formed; a chamber including a first space and a second space which are partitioned by the first member; and a removing device including a first supply device configured to supply a first gas containing unsaturated hydrocarbon to the first space and a second supply device configured to supply a second gas containing ozone to the second space, and configured to remove contamination on the first member by active species generated by reaction of the first gas with the second gas. | ||
| 地址 | JP | ||