发明名称 |
Method for manufacturing film for film capacitor |
摘要 |
A film for film capacitors having a thickness of 10 microns or less, is manufactured by the successive steps of: mixing and preparing a forming material composed of a thermoplastic resin composition; melting and extruding the forming material to a film through a T-die; pinching and cooling the film between a pressure roll and a cooling roll having a rough surface for forming a rough surface to the film, wherein the rough surface of the cooling roll has (σ/Ra) of 0.2 or less, and the rough surface of the film has (σ/Ra) of 0.2 or less, where (Ra) is an arithmetic average roughness defined by a method specified in JIS B 0601 2001, and (σ) is a standard deviation; and rolling up the cooled film onto a winding tube in a winding unit. |
申请公布号 |
US8790558(B2) |
申请公布日期 |
2014.07.29 |
申请号 |
US201012969173 |
申请日期 |
2010.12.15 |
申请人 |
Shin-Etsu Polymer Co., Ltd. |
发明人 |
Suzuki Kazuhiro;Takizawa Kenro;Yoneyama Masaru;Ishida Junya |
分类号 |
D01D5/16 |
主分类号 |
D01D5/16 |
代理机构 |
Arent Fox LLP |
代理人 |
Arent Fox LLP |
主权项 |
1. A method for manufacturing a film for film capacitors having a thickness of 10 microns or less, comprising the successive steps of:
mixing and preparing a forming material composed of a thermoplastic resin composition; melting and extruding the forming material to a film through a T-die; pinching and cooling the film between a pressure roll and a cooling roll having a rough surface for forming a uniform rough surface on the film, wherein the rough surface of the cooling roll has (σ/Ra) of 0.2 or less, and the uniform rough surface of the film has (σ/Ra) of 0.2 or less, where (Ra) is an arithmetic average roughness defined by a method specified in JIS B 0601 2001, and (σ) is a standard deviation; and rolling up the cooled film onto a winding tube in a winding unit, wherein the film has surface properties of (Ra) of 0.2 microns or less, (Rz/Ra) of 10 or less and a dynamic friction coefficient of 1.5 or less, where (Rz) is a maximum height defined by the method specified in JIS B 0601 2001. |
地址 |
Tokyo JP |