发明名称 Manufacture filtration elements
摘要 Selective etching techniques are used to manufacture a basic filtration element, which can then be used as a basis for constructing various devices for different applications. In this process, sheets of etchable material are etched from one or both sides of that sheet to form channels in a premasked pattern, which controls the minimum opening of the filtration element. The desired channel opening is only limited by the capability of the photochemical etching system being used. Alternatively, a filter element may be made by rolling or extruding a first sheet to form a plurality of recessed areas bordered by lands, selectively etching or punching through the recessed pattern areas, and bonding a second sheet having a plurality of etched or punched through areas to the first sheet, and, aligning the etched through areas to the second sheet with the recessed areas of the first sheet.
申请公布号 US8790528(B2) 申请公布日期 2014.07.29
申请号 US201213450288 申请日期 2012.04.18
申请人 发明人 Kwok Kleo
分类号 B01D29/00;A62B23/02;B01D46/40;B01D29/01;B01D46/00 主分类号 B01D29/00
代理机构 Hayes Soloway P.C. 代理人 Hayes Soloway P.C.
主权项 1. A method of forming a filter material comprising the steps of: providing a sheet material; rolling the sheet material to form a contoured sheet material having a plurality of spaced land and valley areas formed on a first side of the sheet, wherein the land areas are evenly spaced from one another and are thicker than the valley areas; and forming on a second side of the sheet a plurality of vias running to the valleys, wherein the vias are narrower in width than the spacing between the land areas.
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