发明名称 |
Aberration correction device and charged particle beam device employing same |
摘要 |
An aberration correction device includes, between a TEM objective lens and an STEM objective lens, a transfer lens group for transferring a coma-free surface of the TEM objective lens to a multipolar lens, a transfer lens group for transferring the coma-free surface of the TEM objective lens to a multipolar lens, and a transfer lens for correcting fifth-order spherical aberration of the STEM objective lens. |
申请公布号 |
US8791423(B2) |
申请公布日期 |
2014.07.29 |
申请号 |
US201113806057 |
申请日期 |
2011.07.26 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
Hirayama Yoichi |
分类号 |
H01J37/153;H01J3/12;H01J37/28 |
主分类号 |
H01J37/153 |
代理机构 |
Crowell & Moring LLP |
代理人 |
Crowell & Moring LLP |
主权项 |
1. A charged particle beam device comprising:
a charged particle source; an illumination lens configured to adjust an amount of a beam of charged particles emitted by the charged particle source; a projection lens configured to project the charged particles that have passed through a specimen, onto detection means; a first objective lens; an aberration correction device; and a second objective lens, wherein the first objective lens, the aberration correction device, and the second objective lens are disposed in this order between the illumination lens and the projection lens, and wherein the aberration correction device comprises:
a first multipole lens disposed adjacent to the illumination lens;a second multipole lens disposed adjacent to the projection lens;a plurality of first transfer lenses disposed between the first and second multipole lenses and configured to transfer, to the second multipole lens, a coma-free condition of the first objective lens disposed adjacent to the illumination lens;a plurality of second transfer lenses disposed so as to be closer to the illumination lens than the first multipole lens and configured to transfer the coma-free condition of the first objective lens to the first multipole lens; and a third transfer lens disposed so as to be closer to the projection lens than the second multipole lens and configured to correct a fifth-order spherical aberration of the second objective lens disposed adjacent to the projection lens; wherein
the first and second objective lenses are an objective lens for transmission electron microscope (TEM) and an objective lens for scanning transmission electron microscope (STEM), respectively, anda specimen stage for TEM is disposed adjacent to the objective lens for TEM, and a specimen stage for STEM is disposed adjacent to the objective lens for STEM. |
地址 |
Tokyo JP |