发明名称 PRETREATMENT METHOD, GRAPHENE FORMING METHOD AND GRAPHENE FABRICATION APPARATUS
摘要 A pretreatment method is performed before a graphene grows by performing a CVD method on a catalyst metal layer formed on a workpiece. The method includes a plasma treatment process in which the catalyst metal layer is activated by applying plasma of a treatment gas including a reducing gas and a nitrogen-containing gas on the catalyst metal layer.
申请公布号 KR20140093939(A) 申请公布日期 2014.07.29
申请号 KR20147011658 申请日期 2012.11.05
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUMOTO TAKASHI
分类号 C01B31/02 主分类号 C01B31/02
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