发明名称 LASER PROCESSING DEVICE FOR WAFER DICING AND WAFER DICING METHOD USING THE SAME
摘要 Provided are a wafer dicing laser processing device and a wafer dicing method using the same. The wafer dicing laser processing device according to an embodiment of the present invention includes a beam generator for generating laser beam; a condensing unit for concentrating the laser beam from the beam generator on a wafer; a liquid crystal on silicon (LCoS) which is arranged on the light path of the laser beam between the beam generator and the condensing unit and outputs pattern images changing the polarization characteristics of the laser beam; and a control unit which is connected to the LCoS and applies a signal for controlling the pattern images to the LCoS.
申请公布号 KR101423497(B1) 申请公布日期 2014.07.29
申请号 KR20120132831 申请日期 2012.11.22
申请人 发明人
分类号 B23K26/00;H01L21/301 主分类号 B23K26/00
代理机构 代理人
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