发明名称 Polycrystalline diamond compact including a polycrystalline diamond table with a thermally-stable region having a copper-containing material and applications therefor
摘要 Embodiments of the invention relate to polycrystalline diamond compacts (“PDCs”) comprising a preformed polycrystalline diamond (“PCD”) table including a thermally-stable region having a copper-containing material disposed interstitially between bonded diamond grains thereof, and methods of fabricating such PDCs. In an embodiment, a PDC includes a substrate, and a preformed PCD table having an interfacial surface bonded to the substrate and a generally opposing upper surface. The PCD table includes a plurality of diamond grains exhibiting diamond-to-diamond bonding therebetween and defining a plurality of interstitial regions. The preformed PCD table further includes a first region extending inwardly from the upper surface that includes a copper-containing material disposed therein and a second region extending inwardly from the interfacial surface that includes a nickel-containing material disposed therein.
申请公布号 US8790430(B1) 申请公布日期 2014.07.29
申请号 US201213690397 申请日期 2012.11.30
申请人 US Synthetic Corporation 发明人 Miess David P.;Vail Michael A.;Bertagnolli Kenneth E.;McMurray C. Eugene;Jones Paul Douglas
分类号 B24D3/00;B24D3/06;E21B10/46 主分类号 B24D3/00
代理机构 Dorsey & Whitney LLP 代理人 Dorsey & Whitney LLP
主权项 1. A polycrystalline diamond compact, comprising: a substrate; and a polycrystalline diamond table including an interfacial surface bonded to the substrate and a generally opposing upper surface, the polycrystalline diamond table including a plurality of diamond grains exhibiting diamond-to-diamond bonding therebetween and defining a plurality of interstitial regions, the polycrystalline diamond table further including: a first region extending inwardly from the upper surface to an intermediate depth, the first region including a copper-manganese-containing material disposed in at least a first portion of the plurality of interstitial regions; anda second region extending inwardly from the interfacial surface and including a nickel-containing material disposed in at least a second portion of the plurality of interstitial regions.
地址 Orem UT US