发明名称 |
Polycrystalline diamond compact including a polycrystalline diamond table with a thermally-stable region having a copper-containing material and applications therefor |
摘要 |
Embodiments of the invention relate to polycrystalline diamond compacts (“PDCs”) comprising a preformed polycrystalline diamond (“PCD”) table including a thermally-stable region having a copper-containing material disposed interstitially between bonded diamond grains thereof, and methods of fabricating such PDCs. In an embodiment, a PDC includes a substrate, and a preformed PCD table having an interfacial surface bonded to the substrate and a generally opposing upper surface. The PCD table includes a plurality of diamond grains exhibiting diamond-to-diamond bonding therebetween and defining a plurality of interstitial regions. The preformed PCD table further includes a first region extending inwardly from the upper surface that includes a copper-containing material disposed therein and a second region extending inwardly from the interfacial surface that includes a nickel-containing material disposed therein. |
申请公布号 |
US8790430(B1) |
申请公布日期 |
2014.07.29 |
申请号 |
US201213690397 |
申请日期 |
2012.11.30 |
申请人 |
US Synthetic Corporation |
发明人 |
Miess David P.;Vail Michael A.;Bertagnolli Kenneth E.;McMurray C. Eugene;Jones Paul Douglas |
分类号 |
B24D3/00;B24D3/06;E21B10/46 |
主分类号 |
B24D3/00 |
代理机构 |
Dorsey & Whitney LLP |
代理人 |
Dorsey & Whitney LLP |
主权项 |
1. A polycrystalline diamond compact, comprising:
a substrate; and a polycrystalline diamond table including an interfacial surface bonded to the substrate and a generally opposing upper surface, the polycrystalline diamond table including a plurality of diamond grains exhibiting diamond-to-diamond bonding therebetween and defining a plurality of interstitial regions, the polycrystalline diamond table further including:
a first region extending inwardly from the upper surface to an intermediate depth, the first region including a copper-manganese-containing material disposed in at least a first portion of the plurality of interstitial regions; anda second region extending inwardly from the interfacial surface and including a nickel-containing material disposed in at least a second portion of the plurality of interstitial regions. |
地址 |
Orem UT US |