发明名称 Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layout
摘要 A method of determining calibration test patterns to be utilized to calibrate a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining a model equation representing the imaging performance of the optical imaging system; transforming the model equation into a plurality of discrete functions; identifying a calibration pattern for each of the plurality of discrete functions, where each calibration pattern corresponding to one of the plurality of discrete functions being operative for manipulating the one of the plurality of discrete functions during a calibration process; and storing the calibration test patterns identified as corresponding to the plurality of discrete functions. The calibration test patterns are then utilized to calibrate the model for simulating the imaging performance of an optical imaging system.
申请公布号 US8792147(B2) 申请公布日期 2014.07.29
申请号 US200711889574 申请日期 2007.08.14
申请人 ASML Netherlands B.V. 发明人 Tejnil Edita
分类号 H04N1/46 主分类号 H04N1/46
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. A computer-implemented method of selecting a set of calibration test patterns to be utilized to calibrate a model for simulating the imaging performance of a lithographic process for generating an aerial image corresponding to a target pattern for an integrated circuit; said method comprising the steps of: defining said model as a plurality of discrete functions; identifying a respective calibration pattern for each of said plurality of discrete functions, including determining that each identified calibration pattern is operative for manipulating said respective one of said plurality of discrete functions more than any other of said plurality of discrete functions during a process for calibrating said model that has yet to be performed; and storing said calibration test patterns, said stored calibration test patterns being utilized as said set of calibration patterns to calibrate said model for simulating the imaging performance of said lithographic process, wherein one or more of the above steps are implemented by the computer.
地址 Veldhoven NL