发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTRO-OPTIC DEVICE, SUBSTRATE FOR ELECTRO-OPTIC DEVICE, ELECTRO-OPTIC DEVICE AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electro-optic device which is improved in a yield, and high in productivity, a substrate for an electro-optic device, an electro-optic device and an electronic apparatus.SOLUTION: A method for manufacturing a substrate for an electro-optic device includes: a process of forming a mask layer 71 having conductivity on a surface 11a of a mother substrate 60 from which a plurality of prism substrates 10 can be segmented; and an etching process of performing dry etching to the mother substrate 60 on which the mask layer 71 is formed, in which the mask layer 71 is divided into a plurality of regions before the etching process.
申请公布号 JP2014137525(A) 申请公布日期 2014.07.28
申请号 JP20130006991 申请日期 2013.01.18
申请人 SEIKO EPSON CORP 发明人 ITO SATOSHI;IIZUKA SHOTA
分类号 G09F9/00;G02F1/1333;G09F9/30 主分类号 G09F9/00
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