| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method capable of manufacturing a hologram to which a desired diffraction characteristic is accurately applied.SOLUTION: A hologram manufacturing method includes a step for creating an intermediate hologram by exposing an intermediate photosensitive material from mutually different sides by reference light in a first wavelength region and object light and a step for exposing a photosensitive material by reference light in the first wavelength region, which is made incident on the photosensitive material laminated on the intermediate hologram, and object light composed of the reference light in the first wavelength region, which is diffracted by the intermediate hologram after transmitting the photosensitive material. An exposure condition of the intermediate photosensitive material and the photosensitive material is determined while considering a diffraction characteristic of an inspection hologram obtained by exposing an inspecting photosensitive material from mutually different sides by the reference light in the first wavelength region and the object light. |
